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Comparison ledger

200 PCUversusNV GSD A 80

Axcelis 200 PCU, Axcelis NV GSD A 80, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
200 PCUAxcelis
OEMAxcelisAxcelis
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones2000 Vintage—
Control system——
Generation——
FamilyAxcelis NV GSD 200Axcelis NV GSD A 80
Cited variants
  • Fusion 200 PCU[1]
  • Fusion 200 PCU-P[2]
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Specifications
P/NSC 4840 A[3]—
Frequency50 Hz[3]50 Hz[5]
Phase3 Phase[3]3 Phase[4]
Voltage400 V[3]200 V[5]
Power—30 KVA[4]
Gas—BF3, ASH3, AR[4]
Configuration—Pumps:[4]
P1—Turbo Pump Mitsubishi PT 1500[4]
P2—Cyro Pump Suzuki-Syokan A200[4]
P3—Cryo Pump Suzuki-Syokan A300[4]
RP1—Dry Pump Ebara A07V[4]
RP2—Dry Pump Ebara A30V[4]
RP3—Alcatel Drytel34[4]
Manufacturer—Axcelis[4]
Model—NV GSD A 80[4]
Equipment type—Ion implanter[6]
Wafer size—8 inch[4]
Power rating—30 KVA[4]
Gas delivery—BF3, ASH3, AR[4]
Pump P1—Turbo Pump Mitsubishi PT 1500[4]
Pump P2—Cyro Pump Suzuki-Syokan A200[4]
Pump P3—Cryo Pump Suzuki-Syokan A300[4]
Pump RP1—Dry Pump Ebara A07V[4]
Pump RP2—Dry Pump Ebara A30V[4]
Pump RP3—Alcatel Drytel34[4]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]exapro.comexapro.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com
  6. [6]waferpedia.comwaferpedia.com