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Comparison ledger

NV GSD 100versus160 XP Ion

Axcelis NV GSD 100, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
NV GSD 100Axcelis
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 100Varian 160 XP Ion
Specifications
Phase3 Phase[1]—
Input208 V[1]—
Output160 KV[1]—
Power50 KVA[1]—
Current15 MA[1]—
ConfigurationElectron Shower[1]150mm High Current IMP[4]
TypeIon implanter[2]—
Input voltage208 V[1]—
Electron showerPresent[3]—
DriveDirect drive[3]—
CellCell V6[1]—
Control/softwareSolaris[3]—
Gas boxSDS Gas Box[3]—
OEM—Varian[5]
Model—160 XP Ion[5]
Category—Ion Implantation[4]
Tool type—ion implanter[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]waferpedia.comwaferpedia.com
  5. [5]Equipment inventory listing