Comparison ledger
Canon FPA 5510 IX, Nikon NSR-2205i11D, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 5510 IXCanon | NSR-2205i11DNikon |
|---|---|---|
| OEM | Canon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | 0.35 micron |
| Introduced | — | — |
| Production run | — | 1995– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 5510 | Nikon NSR-2205i11D |
| Specifications | ||
| Configuration | No hard disk[2] | — |
| Tool type | — | Step-and-Repeat System[1] |
| Process node | — | 0.35 micron[1] |
| Node | — | 0.35 micron[1] |
| Technology Node | — | 0.35 micron[1] |
| Type | — | Step-and-repeat system[1] |
| Resolution node | — | 0.35 micron[1] |
| Machine type | — | Step-and-Repeat System[1] |
| Target design node | — | 0.35 micron[1] |
| System type | — | Step-and-repeat system[1] |
| Target node | — | 0.35 micron[1] |
| Design node | — | 0.35 micron[1] |
| Node (resolution) | — | 0.35 micron[1] |
| Resolution | — | 0.35 micron[1] |
| Minimum feature size | — | 0.35 μm[1] |
| Design Rule | — | 0.35 micron[1] |
| Feature Size | — | 0.35 micron[1] |
| Description | — | State-of-the-art workhorse[1] |
| Equipment type | — | Step-and-repeat system[1] |
| Manufacturer | — | Nikon[1] |
| OEM | — | Nikon[1] |
| Model | — | NSR-2205i11D[1] |
| Described use | — | Step-and-Repeat System[1] |
| NA | — | 0.63[3] |
| Exposure source | — | i-line (365 nm wavelength)[3] |
| Reduction ratio | — | 1:5[3] |
| Maximum exposure field | — | 22 mm × 22 mm[3] |
| Overlay accuracy | — | ≤ 70 nm (EGA, |M| + 3σ)[3] |
| Alignment system | — | LSA (standard), FIA (optional), LIA (optional)[3] |
| Date of manufacture | — | 01 Sep 1995[4] |
| Serial number | — | 1105183[4] |
| Wafer size | — | 8 Inch[4] |
| Reticle size | — | 6 Inch[4] |
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