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Nikon

NSR-2205i11D

Lithography0.35 micronNikon NSR-2205i11D family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

NSR-2205i11D — chiphistory.org
Fig. 01NSR-2205i11Dchiphistory.org[1]

What it is

General reference — not yet source-verified

As a lithography tool, it sits in the front end of semiconductor patterning, where it transfers mask-defined images onto photoresist-coated wafers before subsequent etch and deposition steps define device features.

How it works

General reference — not yet source-verified

A step-and-repeat lithography system exposes one field at a time and then moves the wafer to the next field until the full wafer is patterned. The optical system reduces the mask image and projects it onto the photoresist, using precise wafer positioning and overlay control to place each exposure accurately relative to prior layers.

In this class of equipment, the core subsystems are illumination, reticle handling, projection optics, wafer stage motion, and alignment sensors. The tool’s job is to print repeated copies of the same circuit pattern across many die locations with tight positional control.

Where it fits in the process flow

General reference — not yet source-verified

The NSR-2205i11D is used during wafer patterning after photoresist has been applied and before resist development, etching, or lift-off steps that transfer the pattern into underlying films. It is part of the lithographic definition stage that determines lateral feature placement for later process modules.

What do the numbers mean?

Configuration & options2

Tool type
Step-and-Repeat System[1]
Accurate?
Process node
0.35 micron[1]
Accurate?
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What kind of lithography tool is the NSR-2205i11D?

It is a step-and-repeat system.[1]

Not publicly documented

The following facts about the NSR-2205i11D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • Fewer than 3 independently cited specifications for the NSR-2205i11D are on record; the remainder await public documentation.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR-2205i11D are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the NSR-2205i11D are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the NSR-2205i11D are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the NSR-2205i11D are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]chiphistory.orgchiphistory.orgchiphistory.org
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Inventory photo
  5. [5]Inventory photo
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Last updated Jul 29, 2026.

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