NSR-2205i11D

The Nikon NSR-2205i11D is a step-and-repeat system. The Nikon NSR-2205i11D is an i-line stepper. The Nikon NSR-2205i11D has resolution of 350 nm or finer. The Nikon NSR-2205i11D uses an i-line exposure source at 365 nm. The Nikon NSR-2205i11D has numerical aperture of 0.63. The Nikon NSR-2205i11D uses 1:5 reduction projection. The Nikon NSR-2205i11D has a maximum exposure field of 22 mm × 22 mm. The Nikon NSR-2205i11D has overlay accuracy of 70 nm or better for EGA, |M| + 3σ. The Nikon NSR-2205i11D supports LSA as standard and FIA and LIA as optional alignment systems.^[7][1]

A step-and-repeat lithography system projects a reduced image from a photomask onto photoresist on a wafer, exposes one field, then moves the wafer and repeats the exposure across the substrate. A machine in this class combines illumination optics, reticle handling, projection optics, wafer staging, focus control, and alignment sensing so that each patterned layer is placed in registration to earlier layers. An i-line stepper uses mercury-lamp spectral output in the i-line band to print features defined by the reticle pattern.

Lithography steppers are used in wafer patterning after photoresist coating and before development and pattern transfer. A tool in this class defines lateral features for later etch, implant, deposition, or lift-off sequence steps. Overlay capability in this class is important because repeated lithography levels must register to structures formed earlier in the process flow.

I-line steppers are used for semiconductor wafer patterning on process layers that can be printed with mature optical lithography. Step-and-repeat exposure tools in this class are applied to repeated die imaging across the wafer and to layer-to-layer registration during integrated-circuit fabrication. Such tools are also used where reduction projection exposure is preferred over full-wafer contact or proximity printing.