Comparison ledger
CEE 100, Karl Suss MJB-3, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | MJB-3Karl Suss |
|---|---|---|
| OEM | CEE | Karl Suss |
| Category | Lithography | Lithography |
| Wafer size | 6" | 3" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Karl Suss MJB-3 |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | — |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Equipment type | Spin coater[3] | — |
| Programming | 10 programs; up to 10 steps per program[2] | — |
| Step parameters | Acceleration, speed, time[2] | — |
| OEM | — | Karl Suss[4] |
| Model | — | MJB-3[4] |
| Type | — | Contact/proximity aligner[4] |
| Illumination wavelengths | — | 365 nm or 405 nm[4] |
| Resists | — | Used with a variety of both positive and negative photoresists[4] |
| Location | — | FabLab | Teaching Lab[4] |
| Maximum substrate diameter | — | up to 3"[4] |
| Sample compatibility | — | works for smaller samples[4] |
| Light options | — | 365 nm or 405 nm light[4] |
| Photoresist compatibility | — | a variety of both positive and negative photoresists[4] |
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