Karl Suss
Plate 01Suss MJB3 350W Mask Aligner (ID 3885)
Plate 02Karl Suss MJB-3 HP/ST Inv# 59511
Plate 03Karl Suss MJB3 Mask Aligner #60007
Plate 04Suss MJB3 350W BSA IR Mask Aligner (ID# 3845)
Plate 05MNTL Karl Suss MJB3 Aligner training
Plate 06Karl Suss MJB3 UV Intensity Measurement and Verification Supplement
Plate 07Karl Suss MJB3 Mask Aligner #59510
Plate 08Karl Suss MJB3 Aligner #60414
Wafer size
3"
Optics
365 nm or 405 nm[1]
Process applications and technology nodes documented for this tool.
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The following facts about the MJB-3 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MJB-3 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MJB-3 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MJB-3 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MJB-3 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MJB-3 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Jul 29, 2026.
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.