Comparison ledger
CEE 100, Nikon NSR 2205 i 8 A i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | |
|---|---|---|
| OEM | CEE | Nikon |
| Category | Lithography | Lithography |
| Wafer size | 6" | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Nikon NSR 2205 |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | Wafer Loader Pre-alignment 2[5] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Equipment type | Spin coater[3] | — |
| Programming | 10 programs; up to 10 steps per program[2] | — |
| Step parameters | Acceleration, speed, time[2] | — |
| Resolution | — | 0.5µm[4] |
| Computer Type | — | PDP11[5] |
| Rentical Size | — | 5 Inch[5] |
| Field Sizes | — | 15 / 17.5 / 20mm[5] |
| Wafer Size | — | 6 Inch Flat[5] |
| Reticle Libraries | — | 1[5] |
| Wafer Loader | — | Type 1[5] |
| Configuration | — | Barcode Reader[5] |
| Wafer Loader Indexers | — | 2[5] |
| Autofocus | — | Single Point[5] |
| Chuck Type | — | Ceramic Ring Chuck[5] |
| Water Stage | — | Ballscrew[5] |
| MCS2 Version | — | 2.4B[5] |
| OEM | — | Nikon[5] |
| Model | — | NSR 2205 i 8 A i-Line[5] |
| Category | — | Lithography[4] |
| Retical size | — | 5 Inch[5] |
| Wafer size flat | — | 6 Inch Flat[5] |
| Wafer loader pre-alignment | — | 2[5] |
| Barcode reader | — | Yes[5] |
| FIA | — | Yes[5] |
| LSA | — | Yes[5] |
| LIA | — | Yes[5] |
| Levelling | — | Yes[5] |
| Vintage | — | 1991[5] |
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