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Comparison ledger

1000 Hot PlateversusMB 80 Mini Brute Diffusion

CEE 1000 Hot Plate, Thermco MB 80 Mini Brute Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMCEEThermco
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateThermco MB 80
Cited variants—
  • MB 80 Mini Brute Diffusion[1]
Specifications
Configuration4"[2]6.5 Bore[3]
TypeHot Plate[2]Diffusion furnace[4]
Wafer Size4 inch[2]—
Temperature—1200°C[3]
Manufacturer—Thermco[3]
Model—MB 80[3]
Maximum temperature—1200°C[3]
Process capacity—Up to 6 in. wafers[5]
Furnace type—Horizontal tube atmospheric furnace system[5]
Processes—Oxidation, annealing, alloying[5]
Control—Manually controlled by the user[5]
Atmosphere features—Forming gas purge and water bubbler for wet oxidation applications[5]
Tube size—6 in. dia. inside dimension[6]
Controller—Digital programmable controller[6]
Temperature range—400°C to +1300°C[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]cores.research.asu.educores.research.asu.edu
  6. [6]yorkscientific.comyorkscientific.com