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Comparison ledger

1000 Hot Plateversus450 PB Polyimide

CEE 1000 Hot Plate, YES 450 PB Polyimide, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMCEEYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateYES 450
Cited variants—
  • YES 450PB 8-2P-CP[1]
Specifications
Configuration4"[2]50/60 Hz[3]
TypeHot Plate[2]—
Wafer Size4 inch[2]—
Phase—3 Phase[3]
Voltage—208 Vac[3]
Equipment type—Polyimide bake oven[4]
Wafer size—8 inch[3]
Line frequency—50/60 Hz[3]
Input voltage—208 Vac[3]
Heating temperature—heats ambient to 450 deg C[1]
Cassette capacity—holds 2 cassettes of 8-inch wafers[1]
Process chamber ID—9.4 W x 18.1 D x 9.8[1]
Atmosphere—N2/VACUUM[1]
Filter—100 micron laminar flow filter[1]
Power—3 Phase[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]jmind.comjmind.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com