Comparison ledger
CEE 200 Spin, Solitec 5110 C Photoresist Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | 5110 C Photoresist SpinSolitec |
|---|---|---|
| OEM | CEE | Solitec |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | 100A, 3 sigma, full radius uniformity across a wafer |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 200 | Solitec 5110 C Photoresist Spin |
| Cited variants | — | |
| Specifications | ||
| Phase | 1 Phase[2] | — |
| Type | Spin Coater[2] | — |
| Model | 200[2] | — |
| Make | CEE[2] | — |
| Wafer Sizes | 8 inch[2] | — |
| Configuration | 1 Phase[2] | Control Panel has 5 potentiometers for speed setting with individual 0-99.9s timers[1] |
| Equipment type | Spin Coater[2] | — |
| Spin speed | 5000 rpm[3] | — |
| Substrate support | Flat substrates up to 200 mm or fragments[3] | — |
| Substrate thickness max | 12 mm[3] | — |
| Coating thickness | Uniform coating thickness up to 100 µm[3] | — |
| Wafer Handling | — | Manual with loading paddle to center wafer[1] |
| Solvent Dispense | — | Pressurized tank required[1] |
| Substrate Sizes (Max) | — | 9" Round, 6" square, 9" diagonal rectangular[1] |
| Tachometer | — | Digital readout from optical encoder, 10 rmp resolution[1] |
| Acceleration | — | Variable from 1,000 to 40,000 rpm/sec[1] |
| Process Control | — | Digital timers with manual programming, relay logic[1] |
| Time | — | Variable from 1 to 999 sec in 1 sec increments[1] |
| With precise dispense adjustment | — | 0.5 to 38 mlt 1%, viscosity 4 to 10,000 centistokes[1] |
| Wafer size | — | 100A, 3 sigma, full radius uniformity across a wafer[1] |
| Extra Resist Pumps | — | P/N 0967[1] |
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