Comparison ledger
CEE 200 Spin, SUSS MicroTec Falcon, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | FalconSUSS MicroTec |
|---|---|---|
| OEM | CEE | SUSS MicroTec |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | Wafer Backside Rinse |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 200 | SUSS MicroTec Falcon |
| Specifications | ||
| Phase | 1 Phase[1] | — |
| Type | Spin Coater[1] | — |
| Model | 200[1] | Falcon[4] |
| Make | CEE[1] | — |
| Wafer Sizes | 8 inch[1] | — |
| Configuration | 1 Phase[1] | Polyimid[3] |
| Equipment type | Spin Coater[1] | — |
| Spin speed | 5000 rpm[2] | — |
| Substrate support | Flat substrates up to 200 mm or fragments[2] | — |
| Substrate thickness max | 12 mm[2] | — |
| Coating thickness | Uniform coating thickness up to 100 µm[2] | — |
| Cassette Elevators | — | 2[3] |
| Developer Dispensers | — | 2[3] |
| Wafer size | — | Wafer Backside Rinse[4] |
| Number of Hot Plates | — | 0[3] |
| Number of Chill Plates | — | 0[3] |
| Controller Type | — | Microprocessor Controller[3] |
| Power Requirements | — | 380 V, 50/60 Hz, 3 Phase[3] |
| OEM | — | SUSS MicroTec[4] |
| Category | — | Resist Processing[4] |
| Wafer sizes | — | 6, 8 inch[3] |
| Process | — | Polyimid[3] |
| Chambers | — | 2 chambers[3] |
| Hot plates | — | 0[3] |
| Chill plates | — | 0[3] |
| Vintage | — | 1996[3] |
| Gas delivery | — | 2[4] |
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