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Comparison ledger

635 versus Discovery 18

Denton Vacuum 635 and Denton Vacuum Discovery 18, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
635Denton Vacuum
Discovery 18Denton Vacuum
OEMDenton VacuumDenton Vacuum
CategoryDepositionDeposition
Wafer size8"6-inch diameter stage
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyDenton Vacuum 635Denton Vacuum Discovery
Specifications
OEMDenton Vacuum[1]
Model635[1]
Tool typeDeposition[2]
Process capabilitiesFour confocal cathodes, inclined 25 degrees off vertical[1]
Standard targets4" Au, 4" Cr, 3" Pt, 3" Ti[1]
Film thickness rangeFrom a few nm to hundreds of nm[1]From a few nm to hundreds of nm[3]
Sputter power suppliesDC1 pulse or DC, DC2, RF1[1]
Cathode switchingSwitch-control any supply to any cathode[1]
Co-sputter capabilityYes[1]Yes[3]
Substrate pre-cleanRF2 supply[1]
Reactive sputteringNitrogen or oxygen[1]Available with nitrogen or oxygen[3]
Stage diameter8 inch[1]6-inch diameter stage[3]
Substrate rotation+/- 5% uniformity[1]
Chamber base pressure2 x 10^-7 Torr in 12 hours[1]
Substrate heatingUp to 500 C[1]Up to 200 C[3]
Liftoff depositionWith water-cooled stage[1]Available with sputter power[3]
Argon pressure range< 1-90 mT[1]3-15 mT controllable with 200 sccm MFC controller[3]
APC / MFC controller100 sccm MFC controller[1]
Deposition typeSputter deposition of metals, alloys, and insulating thin films[3]
CathodesThree 3-inch diameter confocal cathodes[3]
RF power supplies2 RF power supplies[3]
DC power supplySwitchable DC power supply[3]
Substrate rotation uniformity+/- 10%[3]
Pump systemCryo and turbo pumped[3]
Base pressure1 x 10^7 Torr[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]nanofab.utah.edunanofab.utah.edu
  2. [2]nanofab.utah.edunanofab.utah.edu
  3. [3]nanofab.utah.edunanofab.utah.edu