Denton Vacuum

635

Deposition 8"Denton Vacuum 635 family

Research Quality: 40% complete

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635 — nanofab.utah.edu — Fig. 01635nanofab.utah.edu^[1]

Wafer size

Power

DC1 pulse or DC, DC2, RF1^[1]

Vacuum

Denton Vacuum^[1]

Gas delivery

100 sccm MFC controller^[1]

Optics

From a few nm to hundreds of nm^[1]

What is it?

The sources describe the Denton Vacuum 635 as a deposition tool used for magnetron sputtering. Listed capabilities include four confocal cathodes inclined 25 degrees off vertical, standard targets for Au, Cr, Pt, and Ti, co-sputter capability, substrate pre-clean, reactive sputtering with nitrogen or oxygen, an 8-inch diameter stage, substrate rotation, heated-stage operation up to 500 C, and liftoff deposition with a water-cooled stage.

What can it run?

Process applications and technology nodes documented for this tool.

Magnetron sputtering
Deposition

What do the numbers mean?

Power & electrical1

Sputter power supplies: DC1 pulse or DC, DC2, RF1^[1]

Vacuum & pumping3

OEM: Denton Vacuum^[1]
Chamber base pressure: 2 x 10^-7 Torr in 12 hours^[1]
Argon pressure range: < 1-90 mT^[1]

Wafer handling3

Substrate pre-clean: RF2 supply^[1]
Substrate rotation: +/- 5% uniformity^[1]
Substrate heating: Up to 500 C^[1]

Gas & chemistry1

APC / MFC controller: 100 sccm MFC controller^[1]

Optics & imaging1

Film thickness range: From a few nm to hundreds of nm^[1]

Control & software1

Cathode switching: Switch-control any supply to any cathode^[1]

Configuration & options8

Model: 635^[1]
Tool type: Deposition^[2]
Process capabilities: Four confocal cathodes, inclined 25 degrees off vertical^[1]
Standard targets: 4" Au, 4" Cr, 3" Pt, 3" Ti^[1]
Co-sputter capability: Yes^[1]
Reactive sputtering: Nitrogen or oxygen^[1]
Stage diameter: 8 inch^[1]
Liftoff deposition: With water-cooled stage^[1]

Interested in this tool?

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What replaced it?

siblingDenton Vacuum Discovery 18— Listed on the same equipment page under deposition alongside Denton 635.source^[2]
siblingDenton Vacuum SJ20C— Listed on the same equipment page under deposition alongside Denton 635.source^[2]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

OEMDenton Vacuum^[1]
Sputter power suppliesDC1 pulse or DC, DC2, RF1^[1]
Chamber base pressure2 x 10^-7 Torr in 12 hours^[1]
Argon pressure range< 1-90 mT^[1]
APC / MFC controller100 sccm MFC controller^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the 635 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 635 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 635 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 635 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 635 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 635 is not on record.
Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources

[1]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
[2]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
[3]https://www.nanofab.utah.edu/wp-content/uploads/2022/11/Denton-635-SOP-pdf.pdf — nanofab.utah.edunanofab.utah.edu