Comparison ledger
Denton Vacuum Discovery and Denton Vacuum Discovery 18, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | DiscoveryDenton Vacuum | Discovery 18Denton Vacuum |
|---|---|---|
| OEM | Denton Vacuum | Denton Vacuum |
| Category | Deposition | Deposition |
| Wafer size | — | 6-inch diameter stage |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Denton Vacuum Discovery | Denton Vacuum Discovery |
| Specifications | ||
| Configuration | With Lipon Deposition[1] | — |
| Deposition type | — | Sputter deposition of metals, alloys, and insulating thin films[2] |
| Film thickness range | — | From a few nm to hundreds of nm[2] |
| Cathodes | — | Three 3-inch diameter confocal cathodes[2] |
| RF power supplies | — | 2 RF power supplies[2] |
| DC power supply | — | Switchable DC power supply[2] |
| Co-sputter capability | — | Yes[2] |
| Reactive sputtering | — | Available with nitrogen or oxygen[2] |
| Stage diameter | — | 6-inch diameter stage[2] |
| Substrate rotation uniformity | — | +/- 10%[2] |
| Pump system | — | Cryo and turbo pumped[2] |
| Base pressure | — | 1 x 10^7 Torr[2] |
| Substrate heating | — | Up to 200 C[2] |
| Liftoff deposition | — | Available with sputter power[2] |
| Argon pressure range | — | 3-15 mT controllable with 200 sccm MFC controller[2] |
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