Comparison ledger
EV Group 101, OAI 200 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | 200 MaskOAI |
|---|---|---|
| OEM | EV Group | OAI |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | OAI 200 Mask |
| Cited variants | — |
|
| Specifications | ||
| OEM | EV Group[2] | — |
| Model | 101[2] | 200[5] |
| Equipment name | EVG 101 Spray Coater[2] | — |
| NEMO ID | evgspraycoat[2] | — |
| Training required | EVG 101 Training[2] | — |
| Training duration | 1.50 hours[2] | — |
| Processing technique | Resist Spray Coat (manual)[2] | — |
| Cleanliness | "All"[2] | — |
| Location | SNF Paul G Allen L107 Cleanroom[2] | — |
| Wafer diameter (substrate size) | up to 300 mm[3] | — |
| Available modules | Spin coat / OmniSpray® / develop[3] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[3] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[3] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[4] | — |
| Cleanliness group (at SNF) | "All"[2] | — |
| Configuration | — | Double Sided[5] |
| Type | — | tabletop mask aligner[1] |
| Resolution | — | one micron[1] |
| Alignment precision | — | one micron[1] |
| Alignment accuracy | — | 2 µm[6] |
| Objectives | — | 5x, 10x, and 2x objectives[6] |
| Exposure modes | — | contact, soft-contact, and proximity[7] |
| Light source options | — | collimated Hg lamp UV light source or UV LED light source[1] |
| UV LED wavelengths | — | 365nm, 405nm, or 436nm[1] |
| Chuck | — | dual windows in chuck for 4" wafers[5] |
| Alignment axes | — | X, Y, and Z micrometers[1] |
| Frontside alignment | — | designed for high-precision frontside alignment in microfabrication processes[6] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →