Comparison ledger
EV Group 101, OAI Model 2000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | Model 2000OAI |
|---|---|---|
| OEM | EV Group | OAI |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | OAI Model 2000 |
| Cited variants | — | |
| Specifications | ||
| OEM | EV Group[2] | — |
| Model | 101[2] | — |
| Equipment name | EVG 101 Spray Coater[2] | — |
| NEMO ID | evgspraycoat[2] | — |
| Training required | EVG 101 Training[2] | — |
| Training duration | 1.50 hours[2] | — |
| Processing technique | Resist Spray Coat (manual)[2] | — |
| Cleanliness | "All"[2] | — |
| Location | SNF Paul G Allen L107 Cleanroom[2] | — |
| Wafer diameter (substrate size) | up to 300 mm[3] | — |
| Available modules | Spin coat / OmniSpray® / develop[3] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[3] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[3] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[4] | — |
| Cleanliness group (at SNF) | "All"[2] | — |
| Product category | — | UV Exposure Systems[5] |
| Type | — | Edge-bead and UV flood exposure system[1] |
| Exposure beam size | — | Up to 300mm diameter[1] |
| Beam divergence | — | < 2.0° (1/2 angle)[1] |
| Beam spectrum | — | Near UV, Mid UV, Deep UV[1] |
| Beam uniformity | — | ±5.0%[1] |
| Timer | — | 0.1 to 999.9 sec. (0.1 sec. increments)[1] |
| Power supplies | — | 200W to 5,000W[1] |
| Power regulation | — | Better than ±0.5%[1] |
| Intensity control | — | Dual channel optical feedback loop with ±2% precision and long term repeatability[1] |
| Wafer capacity | — | To 300mm[1] |
| Substrate transfer | — | Cassette-to-cassette[1] |
| Handling | — | Vacuum arm (end effector)[1] |
| Flat orientation | — | ±1 degree[1] |
| Precision | — | ±25 microns[1] |
| Z precision | — | ±12.5 microns[1] |
| Electrical | — | 208/60Hz 3-phase[1] |
| Vacuum | — | 25" Hg[1] |
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