Comparison ledger
EV Group 101, OAI Model 30, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | Model 30OAI |
|---|---|---|
| OEM | EV Group | OAI |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | OAI Model 30 |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | — |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Product family | — | UV Exposure Systems[4] |
| Type | — | Benchtop collimated UV exposure system[5] |
| Source type | — | Stabilized arc lamp source[5] |
| Optical integrator | — | Adjustable optical integrator[5] |
| Output spectra | — | 220 nm to 450 nm[6] |
| Output power | — | 200 W to 12 kW[6] |
| Beam size | — | Up to 24 in²[6] |
| Timer range | — | 0.1 to 0.999 seconds[6] |
| Collimation | — | Reflective Köhler illumination design[5] |
| Beam divergence | — | ≤ ±1.5°[5] |
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