Comparison ledger
EV Group 101, SUSS MicroTec MJB 3 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | MJB 3 MaskSUSS MicroTec |
|---|---|---|
| OEM | EV Group | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | SUSS MicroTec MJB |
| Specifications | ||
| OEM | EV Group[1] | SUSS MicroTec[7] |
| Model | 101[1] | MJB 3[7] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Configuration | — | Refurbished[4] |
| Power | — | 350W lamphouse with Ushio USH-350DS Hg lamp[5] |
| Wafer size | — | 3 inch[5] |
| Lamp | — | 350W lamphouse with Ushio USH-350DS Hg lamp[5] |
| Optics type | — | UV400 near UV optics, 350-450 nm[5] |
| Resolution | — | 0.6 µm[5] |
| Microscope | — | Splitfield microscope with Leica objectives 3.5x/10x/20x[6] |
| Vacuum chuck size | — | 3 inch[5] |
| Mask holder size | — | 3x3 inch[5] |
| Tool type | — | Mask aligner[8] |
| Category | — | Lithography[8] |
| Wafer sizes | — | 3 inch[5] |
| Max wafer size | — | 3" diameter[9] |
| Exposure optics | — | UV400 near UV optics, 350-450 nm[6] |
| Lamp house | — | 350W lamphouse with Ushio USH-350DS Hg lamp[5] |
| Exposure modes | — | Vacuum contact, Hard contact, Soft contact[10] |
| Configured alignment | — | Top side alignment[10] |
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