Comparison ledger
EV Group 6200 Mask and EV Group EV-420, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 6200 MaskEV Group | EV-420EV Group |
|---|---|---|
| OEM | EV Group | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 6200 | EV Group EV-420 |
| Specifications | ||
| Configuration | 3 Stations:[1] | — |
| Power | 1000W light source[1] | — |
| Equipment type | — | front & backside mask aligner[2] |
| Type | — | Front & backside mask aligner[3] |
| Exposure source | — | UV[4] |
| Exposure dose (as stated) | — | 625 mJ/cm²[4] |
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