EV Group
The EV Group 6200 Mask is a lithography tool configured for 6-inch and 8-inch wafers. The EV Group 6200 Mask includes 3 stations. The EV Group 6200 Mask includes backside alignment, top view alignment, and 5x optics.[1][2]

Mask aligners are used in the lithography step of wafer fabrication, after photoresist coating and before development.
Backside alignment capability enables double-sided patterning, which is useful for MEMS devices such as pressure sensors and microfluidics.
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The following facts about the 6200 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6200 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 6200 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 6200 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 6200 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 6200 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 5, 2026.
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