EV Group
EV-420
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The EVG EV-420 is a front and backside contact mask aligner. The EVG EV-420 uses a UV source for exposure. The EVG EV-420 is used for contact alignment in lithography processes.[1][2][3][4]
What it is
General reference — not yet source-verifiedMask aligners are photolithography tools used to transfer patterns from a photo mask onto a photoresist-coated substrate. The substrate and mask are aligned under a microscope and then exposed to ultraviolet light to define the pattern.
Where it fits in the process flow
General reference — not yet source-verifiedThe EV-420 is used in the photolithography process after photoresist coating and before development. The substrate is aligned and exposed to define features, then moved to a developer bath to remove exposed or unexposed photoresist.
Applications
The EV-420 has been used to expose spray-coated photoresist layers on high topography substrates, such as wafers with deep-etched cavities. The equipment supports front and backside alignment, making it suitable for double-sided lithography in MEMS and other microdevice fabrication.[4][1][2][3]
- lithography
What do the numbers mean?
Optics & imaging4
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the EV-420 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EV-420 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EV-420 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EV-420 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EV-420 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EV-420 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
- [2]https://www.nanofab.utah.edu/wp-content/uploads/2020/04/NF-tool-list-April-2020.pdf — nanofab.utah.edunanofab.utah.edu
- [3]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
- [4]repository.tudelft.nl — repository.tudelft.nlrepository.tudelft.nl
Last updated Sep 1, 2026.
