Comparison ledger
EV Group 6200 Mask and EV Group IQ Mask, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 6200 MaskEV Group | IQ MaskEV Group |
|---|---|---|
| OEM | EV Group | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | Motorized swivel arm Wafer loading trays required for desired wafer size ic devices. |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 6200 | EV Group IQ Mask |
| Specifications | ||
| Configuration | 3 Stations:[1] | Dual end effector robot handling configuration.[2] |
| Power | 1000W light source[1] | 500W or 1000W Hg lamps house Optical sets:[2] |
| Reinforced stage drives | — | X/Y/Theta axis Internal wedge compensation unit: Automatic wedge compensation Substrate and mask.[2] |
| Wafer size | — | Motorized swivel arm Wafer loading trays required for desired wafer size ic devices.[2] |
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