EV Group
IQ Mask
Wafer size
Motorized swivel arm Wafer loading trays required for desired wafer size ic devices.
Optics
500W or 1000W Hg lamps house Optical sets:[1]
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedMask alignment occurs in the lithography portion of semiconductor processing, after wafer preparation and before pattern transfer into downstream patterning or etch steps.
The EV Group IQ Mask is used for aligning the mask to the substrate before exposure and is therefore part of the front-end patterning flow.
Applications
What do the numbers mean?
Wafer handling6
Optics & imaging10
Performance4
Control & software1
Configuration & options4
- Actual travel range might be restricted by design of tooling:[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What substrate types can this class of lithography equipment handle?General reference — not yet source-verified
Mask aligners of this class are generally designed to handle standard wafers as well as nonstandard substrates such as glass panels, ceramic tiles, or flexible sheets. The exact range depends on the specific stage and chuck configuration, but the machine class is known for substrate flexibility.
How does alignment accuracy affect process results?General reference — not yet source-verified
Alignment accuracy determines how precisely the mask pattern is placed relative to existing structures on the substrate. For multilayer processing, poor alignment creates overlay errors that can bridge or disconnect features. Mask aligners of this class provide alignment capabilities that are adequate for the intended application range, but the exact accuracy must be characterized for each process.
What are the main consumables or wear items in a mask aligner?General reference — not yet source-verified
The primary consumables are the photomasks themselves, which can wear or become contaminated in contact printing. The exposure lamp has a finite lifetime and is periodically replaced. Filters and optical components also require maintenance to preserve exposure uniformity and spectral quality.
Not publicly documented
The following facts about the IQ Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the IQ Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the IQ Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the IQ Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the IQ Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the IQ Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 12, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.