Comparison ledger
EV Group EV-420 and EV Group IQ Mask, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | EV-420EV Group | IQ MaskEV Group |
|---|---|---|
| OEM | EV Group | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | Motorized swivel arm Wafer loading trays required for desired wafer size ic devices. |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group EV-420 | EV Group IQ Mask |
| Specifications | ||
| Equipment type | front & backside mask aligner[1] | — |
| Type | Front & backside mask aligner[2] | — |
| Exposure source | UV[3] | — |
| Exposure dose (as stated) | 625 mJ/cm²[3] | — |
| Configuration | — | Dual end effector robot handling configuration.[4] |
| Reinforced stage drives | — | X/Y/Theta axis Internal wedge compensation unit: Automatic wedge compensation Substrate and mask.[4] |
| Power | — | 500W or 1000W Hg lamps house Optical sets:[4] |
| Wafer size | — | Motorized swivel arm Wafer loading trays required for desired wafer size ic devices.[4] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →