Comparison ledger
Filmetrics F50-UV and Filmetrics R50, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | F50-UVFilmetrics | R50Filmetrics |
|---|---|---|
| OEM | Filmetrics | Filmetrics |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | 8" | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Filmetrics F50-UV | Filmetrics R50 |
| Specifications | ||
| Vendor | Filmetrics[1] | — |
| Model | Filmetrics F50-UV[1] | — |
| Measurement method | spectroscopic reflectometry[2] | — |
| Function | thin-film thickness and optical characteristics measurement[1] | — |
| Automated stage | yes[1] | — |
| Sample size | up to 8 inches in diameter[1] | — |
| Substrate size | ~5 mm × 5 mm to 200 mm diameter[2] | — |
| Thickness measurement range | 5 nm – 40 µm[2] | — |
| Minimum thickness to measure n and k | 50 nm[2] | — |
| Wavelength range | 190–1100 nm[2] | — |
| Spot size | 1.5 mm[2] | — |
| Light source | deuterium + tungsten-halogen (dual light source; may choose one or both lamps)[2] | — |
| Measurement results visualization | 2D and 3D[2] | — |
| Default configuration | — | configured by default for metallic layers[3] |
| Default sample thickness | — | 525 um +/- 25 um[3] |
| Equipment section | — | Metrology[3] |
| Related equipment on same page group | — | AIT CMT-SR2000N 4-Point Probe Measurement System; MPI TS150 Probe Station[3] |
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