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Comparison ledger

F50-UV versus R50

Filmetrics F50-UV and Filmetrics R50, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
F50-UVFilmetrics
R50Filmetrics
OEMFilmetricsFilmetrics
CategoryMetrology & InspectionMetrology & Inspection
Wafer size8"200mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyFilmetrics F50-UVFilmetrics R50
Specifications
VendorFilmetrics[1]
ModelFilmetrics F50-UV[1]
Measurement methodspectroscopic reflectometry[2]
Functionthin-film thickness and optical characteristics measurement[1]
Automated stageyes[1]
Sample sizeup to 8 inches in diameter[1]
Substrate size~5 mm × 5 mm to 200 mm diameter[2]
Thickness measurement range5 nm – 40 µm[2]
Minimum thickness to measure n and k50 nm[2]
Wavelength range190–1100 nm[2]
Spot size1.5 mm[2]
Light sourcedeuterium + tungsten-halogen (dual light source; may choose one or both lamps)[2]
Measurement results visualization2D and 3D[2]
Default configurationconfigured by default for metallic layers[3]
Default sample thickness525 um +/- 25 um[3]
Equipment sectionMetrology[3]
Related equipment on same page groupAIT CMT-SR2000N 4-Point Probe Measurement System; MPI TS150 Probe Station[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]uwaterloo.cauwaterloo.ca
  2. [2]confluence.nanofab.ualberta.caconfluence.nanofab.ualberta.ca
  3. [3]epfl.chepfl.ch