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Comparison ledger

F50 versus R50

Filmetrics F50 and Filmetrics R50, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
F50Filmetrics
R50Filmetrics
OEMFilmetricsFilmetrics
CategoryMetrology & InspectionMetrology & Inspection
Wafer size150mm200mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyFilmetrics F50Filmetrics R50
Cited variants
Specifications
ManufacturerFilmetrics[2]
ModelF50-UV[2]
Tool TypeInspection, Test and Characterization[2]
DescriptionThin-Film Reflectometry[2]
Reflection spectrum range190-1100 nm[2]
Light sourcesDeuterium (UV) and Halogen (Vis-nIR)[2]
Thickness / optical constants range10 Å to 150 µm thickness, n, and k measurements[2]
Wafer mapping sizeMotorized mapping on wafers up to 150 mm[2]
Small substrate size≥ 2-3 mm[2]
Measurement spot sizeApprox. 1-2 mm[2]
Measurement capabilityCan model up to three layers with accuracy[2]
Measurement modesMotorized wafer-mapping or non-motorized single-spot measurements[2]
Maximum sample sizeSamples as large as 300 mm in diameter[1]
Stage typeMotorized R-Theta stage[1]
Mapping speedAs quickly as two points per second[1]
Computer interfaceUSB port connection to a Windows computer[1]
Default configurationconfigured by default for metallic layers[3]
Default sample thickness525 um +/- 25 um[3]
Equipment sectionMetrology[3]
Related equipment on same page groupAIT CMT-SR2000N 4-Point Probe Measurement System; MPI TS150 Probe Station[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  3. [3]epfl.chepfl.ch