Waferpedia

Comparison ledger

3696versus, Vistec INS 3000

GCA 3696, Leica , Vistec INS 3000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
3696GCA
OEMGCALeica
Category——
Wafer size150mm200mm
Process nodelegacy semiconductor lithography equipment—
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generationg-line—
FamilyGCA 3696Leica , Vistec INS 3000
Cited variants
  • GCA 6300 DSW 5X g-line Wafer Stepperg-line[1]
—
Specifications
Instrument typePhotorepeater system[1]—
Conversion noteCan be easily converted to function as a GCA 3696 Photorepeater system[1]—
Exposure targetPhotoresist-coated glass plates[1]—
Maximum plate sizeUp to 7"[1]—
Wafer size3" up to 150mm; smaller pieces[1]Single 150/200 mm wafer loadport[3]
Exposure wavelengthg-line (436nm)[1]—
Numerical aperture0.30 N.A.[1]—
Reduction5:1 reduction[1]—
Field sizeVariable field size up to 15mm square[1]—
Minimum feature size<0.9µm[1]—
Registered alignmentTypically <0.25µm[1]—
Mask size5" x 0.090"-thick masks[1]—
Stage motionLaser-controlled stage motion[1]—
TypeStep-and-repeat camera (stepper)[2]Optical defect review station[3]
LensZeiss lens with 0.30 numerical aperture[1]—
Resolution0.9 µm[1]—
Reduction ratio5:1[1]—
Control computerDEC PDP-11/04[2]—
Interface chassis9280 Interface Chassis[2]—
Wafer loadport—Single 150/200 mm wafer loadport[3]
Lighting—Bright field light source; DIC DUV light source[3]
Camera—UV and DUV camera[3]
Optics—6 optics: 150x, 100x, 50x, 25x, 10x, 5x[3]
Software—Viscon Software[3]
Data interface—KLARF input[3]
Sources (3)Every fact above is drawn from these public sources
  1. [1]cnfusers.cornell.educnfusers.cornell.edu
  2. [2]trilicium.catrilicium.ca
  3. [3]dealer listingwotol.com