Waferpedia

Comparison ledger

200 versus 2132

KLA 200 and KLA 2132, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
200KLA
2132KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA 200KLA 2132
Specifications
Supported equipment familyKLA 200 series pattern inspection stations[1]
Related supported equipmentKLA Tencor 300 Series Pattern Inspection Stations, STARlight tools, and URSA tools[1]
Data hub function9X Fileservers are central data hubs serving KLA Tencor reticle inspection equipment[1]
Software function9X System Software supports storage and retrieval of setup and result files and several analysis functions[1]
Product typeWafer inspection system[2]
Relationship to KLA 2135Earlier model than the KLA 2135[2]
Wafer size (primary)200mm (8")[3]
Wafer size (alternate)4", 5", 6" capable[3]
Throughput2–8 wafers per hour[3]
Sensitivity>0.25 µm pixels[3]
Inspection typePatterned wafer defect inspection[3]
OpticsBrightfield, small-pixel, high data rate digital image processing[2]
User interfaceDOS operating system[4]
SAT capabilitySegmented Auto Threshold (SAT) included[3]
Calibration wafer8" DSW calibration wafer included[3]
Vintage (year of introduction)1995[3]

Plan your fab

Building a Metrology & Inspection process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]gsemi.comgsemi.com
  4. [4]tbcl.com.twtbcl.com.tw