Comparison ledger
KLA .204 PSL Wafer, KLA 5200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 5200KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | KLA 5200 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Measurement technology | — | Coherence Probe Microscopy (CPM), a patented white-light interferometric technique[4] |
| Targets measured | — | Surfaces, including low-contrast or grainy targets[4] |
| Feature size capability stated | — | Down to 0.18 µm[4] |
| Software | — | Built-in analysis software[4] |
| User interface | — | Graphical user interface[4] |
| Feature size capability | — | down to 0.18 µm[4] |
| insp | — | Overlay Registration System/6in.[5] |
| Type | — | Comprehensive overlay metrology system[4] |
| Application | — | Overlay metrology for advanced lithography[4] |
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