Comparison ledger
KLA .204 PSL Wafer, Rudolph E25, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | E25Rudolph | |
|---|---|---|
| OEM | KLA | Rudolph |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 2006– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Rudolph E25 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Inspection type | — | Automated wafer edge top and edge normal inspection[4] |
| Throughput | — | Greater than 80 WPH[4] |
| Wafer size | — | 300 mm[4] |
| Certification | — | Class 1 certified[4] |
| Set-up time | — | Approximately 10 minutes to be fully optimized and production ready[4] |
| Defect imaging | — | On-the-fly color defect image capture[4] |
| Detection and classification | — | Automatically detects and classifies defects on the entire wafer edge, from the edge exclusion area to the bottom bevel[4] |
| Illumination | — | Brightfield and darkfield illumination available[4] |
| Defect detection and classification | — | Automatically detects and classifies defects on the entire wafer edge, from the edge exclusion area to the bottom bevel[5] |
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