Comparison ledger
KLA .204 PSL Wafer, Zeiss LEO 1560, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | LEO 1560Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | 6” wafer loading through the loadlock is possible |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Zeiss LEO |
| Specifications | ||
| Configuration | NIST Traceable[1] | 6" stage and loadlock[4] |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Wafer size | — | 6” wafer loading through the loadlock is possible[4] |
| Known issues | — | Some Flickering on image of chamber scope[5] |
| Resolution | — | 1 nm at 20 kV[4] |
| Accelerating voltage | — | 200 V to 30 kV[6] |
| Electron source | — | Schottky field emission gun[4] |
| Detectors | — | In-lens SE and E-T SE detectors[4] |
| Detector (BSE) | — | Robinson backscattered electron detector[6] |
| Stage | — | Fully motorized 6-axis eucentric stage[6] |
| Airlock | — | Integrated 8-inch airlock[6] |
| Maximum wafer loading | — | 4 inch via loadlock, 6 inch via chamber door[4] |
| Operating system | — | Windows 11[6] |
| Software | — | Runs SmartSEM v5[4] |
| Current monitor | — | Integrated current monitor on stage[4] |
| Resolution at 20kV | — | 1nm[4] |
| Max Wafer Diameter (loadlock) | — | 4 inch[4] |
| Max Wafer Diameter (chamber door) | — | 6 inch[4] |
| Control Software (if upgraded) | — | SEMView8000[7] |
Plan your fab
Building a Metrology & Inspection process? Get a complete equipment list.
Open the fab equipment planner →