Comparison ledger
KLA .204 PSL Wafer, Zeiss Merlin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MerlinZeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | 4" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Zeiss Merlin |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Instrument type | — | Scanning electron microscope (SEM)[4] |
| Column | — | GEMINI II[4] |
| Stage | — | 5-axis motorized stage (X, Y, Z, Tilt and Rotation)[4] |
| Loadlock | — | Semi-automatic airlock[4] |
| Control software | — | ZeissSmartSEM[4] |
| Available holders | — | mono samples, cleaved samples, and full 4 inch wafer[4] |
| Detectors | — | In-Lens, HE-SE2, EsB, and EDX detector[4] |
| Holders | — | Mono samples, cleaved samples, and full 4 inch wafer[4] |
| Detector | — | In-Lens detector[4] |
| Software for offline analysis and metrology | — | ProSEM software[4] |
| Electron optical column | — | GEMINI II[4] |
| Sample holders | — | mono samples, cleaved samples, full 4 inch wafer[4] |
| Detector types | — | In-Lens, HE-SE2, EsB, EDX[4] |
| Electron column | — | Gemini II column[4] |
| Wafer holder | — | Full 4-inch wafer[4] |
| Acceleration voltage | — | 0.02–30 kV[5] |
| Probe current | — | few pA–300 nA[5] |
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