Comparison ledger
KLA 2132 and KLA 2351, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 2132KLA | 2351KLA |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | Wafer Transfer System |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2132 | KLA 2351 |
| Specifications | ||
| Product type | Wafer inspection system[1] | — |
| Relationship to KLA 2135 | Earlier model than the KLA 2135[1] | — |
| Wafer size (primary) | 200mm (8")[2] | — |
| Wafer size (alternate) | 4", 5", 6" capable[2] | — |
| Throughput | 2–8 wafers per hour[2] | — |
| Sensitivity | >0.25 µm pixels[2] | — |
| Inspection type | Patterned wafer defect inspection[2] | — |
| Optics | Brightfield, small-pixel, high data rate digital image processing[1] | — |
| User interface | DOS operating system[3] | — |
| SAT capability | Segmented Auto Threshold (SAT) included[2] | — |
| Calibration wafer | 8" DSW calibration wafer included[2] | — |
| Vintage (year of introduction) | 1995[2] | — |
| Configuration | — | With HDD & Software[4] |
| Load Port Qty | — | 2[4] |
| Wavelength Illumination | — | 370~720 nm[4] |
| Wavelength Band | — | Visible, UV[4] |
| Pixel Size | — | 0.16μm / 0.20μm / 0.25μm / 0.39μm / 0.62μm[4] |
| Array Defect Capture Rate | — | ≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[4] |
| Array False Defect Rate | — | ≤1.5%(all sizes)[4] |
| Random Defect Capture Rate | — | ≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[4] |
| Random False Defect Rate | — | ≤1.5% (all sizes)[4] |
| Repeatability | — | ≥90% (20 consecutive run on the same DSW wafer)[4] |
| Wafer size | — | Wafer Transfer System[4] |
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