Waferpedia

Comparison ledger

2132 versus Alpha Step D 300 Stylus

KLA 2132 and KLA Alpha Step D 300 Stylus, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
2132KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyKLA 2132KLA Alpha Step
Specifications
Product typeWafer inspection system[1]
Relationship to KLA 2135Earlier model than the KLA 2135[1]
Wafer size (primary)200mm (8")[2]
Wafer size (alternate)4", 5", 6" capable[2]
Throughput2–8 wafers per hour[2]
Sensitivity>0.25 µm pixels[2]
Inspection typePatterned wafer defect inspection[2]
OpticsBrightfield, small-pixel, high data rate digital image processing[1]
User interfaceDOS operating system[3]
SAT capabilitySegmented Auto Threshold (SAT) included[2]
Calibration wafer8" DSW calibration wafer included[2]
Vintage (year of introduction)1995[2]
ConfigurationIssue with the style module[4]
Instrument typeStylus-based surface profiler[5]
Stylus tip radius2 µm[5]
Step height measurement range50 nm to 300 µm[5]
Measurement principleStylus placed in contact with and dragged along the substrate surface; vertical deflection measures change in step height[5]
Supported substrate typesSilicon, Silicon Germanium, Quartz, Sapphire, Glass, Germanium, Silicon Carbide, Gallium Nitride, III-V, Gallium Arsenide, Polymer, Carbon Polymer Based, Lithium Niobate[5]
Supported substrate sizesPieces, 2 inch, 3 inch, 4 inch, 6 inch wafer[5]
Maximum load1[5]
CleanlinessFlexible[5]
Stylus scan distance used in roughness testing3 mm[6]
Manufacturer locationKLA-Tencor Corporation, Milpitas, CA[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]gsemi.comgsemi.com
  3. [3]tbcl.com.twtbcl.com.tw
  4. [4]inventory listing
  5. [5]snfguide.stanford.edusnfguide.stanford.edu
  6. [6]frontiersin.orgfrontiersin.org