Comparison ledger
KLA 2132 and KLA P-17, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 2132KLA | P-17KLA |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2132 | KLA P-17 |
| Cited variants | — |
|
| Specifications | ||
| Product type | Wafer inspection system[2] | — |
| Relationship to KLA 2135 | Earlier model than the KLA 2135[2] | — |
| Wafer size (primary) | 200mm (8")[3] | — |
| Wafer size (alternate) | 4", 5", 6" capable[3] | — |
| Throughput | 2–8 wafers per hour[3] | — |
| Sensitivity | >0.25 µm pixels[3] | — |
| Inspection type | Patterned wafer defect inspection[3] | — |
| Optics | Brightfield, small-pixel, high data rate digital image processing[2] | — |
| User interface | DOS operating system[4] | — |
| SAT capability | Segmented Auto Threshold (SAT) included[3] | — |
| Calibration wafer | 8" DSW calibration wafer included[3] | — |
| Vintage (year of introduction) | 1995[3] | — |
| Instrument type | — | Mechanical profilometer[5] |
| Z range | — | 1 mm[5] |
| Vertical resolution | — | 0.6 Å[5] |
| Lateral resolution | — | 0.5 µm[5] |
| Step height range | — | Nanometers to 1000 µm[1] |
| Constant force control | — | 0.03 to 50 mg[1] |
| Scan length (without stitching) | — | 200 mm[1] |
| Video camera | — | 5 MP high-resolution color[1] |
| Stylus tip radius options | — | 40 nm to 50 µm[6] |
| Stylus included angle options | — | 20 to 100 degrees[6] |
| Sample chuck range | — | 50 to 200 mm[1] |
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