Comparison ledger
KLA 2132 and KLA P-7, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 2132KLA | P-7KLA |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2132 | KLA P-7 |
| Specifications | ||
| Product type | Wafer inspection system[1] | — |
| Relationship to KLA 2135 | Earlier model than the KLA 2135[1] | — |
| Wafer size (primary) | 200mm (8")[2] | — |
| Wafer size (alternate) | 4", 5", 6" capable[2] | — |
| Throughput | 2–8 wafers per hour[2] | — |
| Sensitivity | >0.25 µm pixels[2] | — |
| Inspection type | Patterned wafer defect inspection[2] | — |
| Optics | Brightfield, small-pixel, high data rate digital image processing[1] | — |
| User interface | DOS operating system[3] | — |
| SAT capability | Segmented Auto Threshold (SAT) included[2] | — |
| Calibration wafer | 8" DSW calibration wafer included[2] | — |
| Vintage (year of introduction) | 1995[2] | — |
| equipment type | — | Stylus profilometer[4] |
| equipment type category | — | Topographical Metrology[5] |
| equipment name as listed | — | Step Profilometer (KLA Tencor P-7)[5] |
| Step Height Range | — | Nanometers to 1000 µm[6] |
| Stylus Tip Radius | — | 2 µm[7] |
| Stylus Bevel | — | 60°[7] |
| Max Scan Length | — | 150 mm[8] |
| Vertical Range | — | 1 mm[8] |
| Sample Size | — | Up to 150 mm[8] |
| Sampling Rate | — | Higher sampling rates increase data resolution, but can introduce noise above 200 Hz[7] |
| Applied Force | — | 0.03 to 50 mg[6] |
| Stylus Material | — | Diamond[6] |
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