Comparison ledger
KLA 2138 and KLA 5200, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 2138KLA | 5200KLA |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2138 | KLA 5200 |
| Specifications | ||
| Product name | KLA-2138[1] | — |
| Type | Wafer Inspection System[1] | — |
| Technology | Ultra-Broadband Technology[1] | — |
| Illumination source | Ultra-broadband (UBB) illumination source[1] | — |
| Optics | Significantly improved brightfield optics[1] | — |
| Detection technology | Segmented Auto Threshold (SAT) technology[1] | — |
| Optional configuration | Integrated SMIF minienvironment[1] | — |
| Measurement technology | — | Coherence Probe Microscopy (CPM), a patented white-light interferometric technique[2] |
| Targets measured | — | Surfaces, including low-contrast or grainy targets[2] |
| Feature size capability stated | — | Down to 0.18 µm[2] |
| Software | — | Built-in analysis software[2] |
| User interface | — | Graphical user interface[2] |
Plan your fab
Building a Metrology & Inspection process? Get a complete equipment list.
Open the fab equipment planner →