Waferpedia

Comparison ledger

2351 versus P-20H

KLA 2351 and KLA P-20H, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
2351KLA
OEMKLAKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer sizeWafer Transfer System
Process node
Introduced
Production run
LifecycleLegacy
Lifecycle milestones
Control system
Generation
FamilyKLA 2351KLA P-20H
Specifications
ConfigurationWith HDD & Software[1]
Load Port Qty2[1]
Wavelength Illumination370~720 nm[1]
Wavelength BandVisible, UV[1]
Pixel Size0.16μm / 0.20μm / 0.25μm / 0.39μm / 0.62μm[1]
Array Defect Capture Rate≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[1]
Array False Defect Rate≤1.5%(all sizes)[1]
Random Defect Capture Rate≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[1]
Random False Defect Rate≤1.5% (all sizes)[1]
Repeatability≥90% (20 consecutive run on the same DSW wafer)[1]
Wafer sizeWafer Transfer System[1]
Tool typeStylus profilometer[3]
Stylus tip radius2 µm[3]
Stylus cone angle60°[3]
Vertical range325 µm[3]
Sensor elementCapacitive sensor element[3]
Motion stagePrecision motion stage[3]
Vertical resolutionRoughly nm scale[3]
Stage movement8 inch[3]
Serial number09940111[3]
Tool ownerJoseph Jacob[3]
Access modeWalk-up tool (no reservation needed)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]nanofab.utah.edunanofab.utah.edu