Comparison ledger
KLA 2351 and KLA P-7, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 2351KLA | P-7KLA |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | Wafer Transfer System | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2351 | KLA P-7 |
| Specifications | ||
| Configuration | With HDD & Software[1] | — |
| Load Port Qty | 2[1] | — |
| Wavelength Illumination | 370~720 nm[1] | — |
| Wavelength Band | Visible, UV[1] | — |
| Pixel Size | 0.16μm / 0.20μm / 0.25μm / 0.39μm / 0.62μm[1] | — |
| Array Defect Capture Rate | ≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[1] | — |
| Array False Defect Rate | ≤1.5%(all sizes)[1] | — |
| Random Defect Capture Rate | ≥90% (0.16 um, 0.20 um, 0.25 um, 0.39 um, 0.62 um sensitivities)[1] | — |
| Random False Defect Rate | ≤1.5% (all sizes)[1] | — |
| Repeatability | ≥90% (20 consecutive run on the same DSW wafer)[1] | — |
| Wafer size | Wafer Transfer System[1] | — |
| equipment type | — | Stylus profilometer[3] |
| equipment type category | — | Topographical Metrology[4] |
| equipment name as listed | — | Step Profilometer (KLA Tencor P-7)[4] |
| Step Height Range | — | Nanometers to 1000 µm[5] |
| Stylus Tip Radius | — | 2 µm[6] |
| Stylus Bevel | — | 60°[6] |
| Max Scan Length | — | 150 mm[7] |
| Vertical Range | — | 1 mm[7] |
| Sample Size | — | Up to 150 mm[7] |
| Sampling Rate | — | Higher sampling rates increase data resolution, but can introduce noise above 200 Hz[6] |
| Applied Force | — | 0.03 to 50 mg[5] |
| Stylus Material | — | Diamond[5] |
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