Comparison ledger
KLA 5200 and KLA Candela CS 20 V, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 5200KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 5200 | KLA Candela CS 20 |
| Specifications | ||
| Measurement technology | Coherence Probe Microscopy (CPM), a patented white-light interferometric technique[1] | — |
| Targets measured | Surfaces, including low-contrast or grainy targets[1] | — |
| Feature size capability stated | Down to 0.18 µm[1] | — |
| Software | Built-in analysis software[1] | — |
| User interface | Graphical user interface[1] | — |
| Voltage | — | 230 VAC[2] |
| Configuration | — | 50/60 Hz[2] |
| Phase | — | 3 Phase[2] |
| Chuck | — | 2-5"[3] |
| Wafer sizes | — | 4-inch and 6-inch[4] |
| Chuck sizes | — | 4-inch and 6-inch[4] |
| Software vs | — | Candela Wafer Version 6.8 Build 16[4] |
| Laser specs | — | 405 nm oblique-incidence laser and 660 nm normal-incidence laser[4] |
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