Comparison ledger
KLA 5200 and KLA P-7, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 5200KLA | P-7KLA |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 5200 | KLA P-7 |
| Specifications | ||
| Measurement technology | Coherence Probe Microscopy (CPM), a patented white-light interferometric technique[1] | — |
| Targets measured | Surfaces, including low-contrast or grainy targets[1] | — |
| Feature size capability stated | Down to 0.18 µm[1] | — |
| Software | Built-in analysis software[1] | — |
| User interface | Graphical user interface[1] | — |
| equipment type | — | Stylus profilometer[2] |
| equipment type category | — | Topographical Metrology[3] |
| equipment name as listed | — | Step Profilometer (KLA Tencor P-7)[3] |
| Step Height Range | — | Nanometers to 1000 µm[4] |
| Stylus Tip Radius | — | 2 µm[5] |
| Stylus Bevel | — | 60°[5] |
| Max Scan Length | — | 150 mm[6] |
| Vertical Range | — | 1 mm[6] |
| Sample Size | — | Up to 150 mm[6] |
| Sampling Rate | — | Higher sampling rates increase data resolution, but can introduce noise above 200 Hz[5] |
| Applied Force | — | 0.03 to 50 mg[4] |
| Stylus Material | — | Diamond[4] |
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