Comparison ledger
KLA Alpha Step D 300 Stylus and KLA P-17, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | P-17KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA Alpha Step | KLA P-17 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Issue with the style module[2] | — |
| Instrument type | Stylus-based surface profiler[3] | Mechanical profilometer[5] |
| Stylus tip radius | 2 µm[3] | — |
| Step height measurement range | 50 nm to 300 µm[3] | — |
| Measurement principle | Stylus placed in contact with and dragged along the substrate surface; vertical deflection measures change in step height[3] | — |
| Supported substrate types | Silicon, Silicon Germanium, Quartz, Sapphire, Glass, Germanium, Silicon Carbide, Gallium Nitride, III-V, Gallium Arsenide, Polymer, Carbon Polymer Based, Lithium Niobate[3] | — |
| Supported substrate sizes | Pieces, 2 inch, 3 inch, 4 inch, 6 inch wafer[3] | — |
| Maximum load | 1[3] | — |
| Cleanliness | Flexible[3] | — |
| Stylus scan distance used in roughness testing | 3 mm[4] | — |
| Manufacturer location | KLA-Tencor Corporation, Milpitas, CA[4] | — |
| Z range | — | 1 mm[5] |
| Vertical resolution | — | 0.6 Å[5] |
| Lateral resolution | — | 0.5 µm[5] |
| Step height range | — | Nanometers to 1000 µm[1] |
| Constant force control | — | 0.03 to 50 mg[1] |
| Scan length (without stitching) | — | 200 mm[1] |
| Video camera | — | 5 MP high-resolution color[1] |
| Stylus tip radius options | — | 40 nm to 50 µm[6] |
| Stylus included angle options | — | 20 to 100 degrees[6] |
| Sample chuck range | — | 50 to 200 mm[1] |
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