Comparison ledger
KLA ICOS CI 8 X 50 Lead, Nikon NSR S 203 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 203 BNikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA ICOS | Nikon NSR S 203 |
| Specifications | ||
| Power | 3.4 kW[1] | 541 mW/cm2[6] |
| Configuration | 15/30 A[1] | 248 nm[4] |
| Air Pressure | 5.5 bar[1] | — |
| Reg Temp | 30 Deg C[1] | — |
| Issue | Keeps homing itself[1] | — |
| Category | Lithography[2] | — |
| Type | Lead scanner[1] | — |
| Electrical | 15/30 A[1] | — |
| Regulated temperature | 30 Deg C[1] | — |
| Frequency | 50/60 Hz[1] | — |
| Computer | Removed; no PC inside[1] | — |
| Known issue | Doors in the front do not stay up as they should[1] | — |
| Software Version | — | MCSV[3] |
| CIM | — | SECS[3] |
| Handler System | — | WL Type 3[3] |
| Factory Interface | — | Open Cassette[3] |
| Excluded | — | Hard Drives (2)[3] |
| Process | — | Scanner[4] |
| Handler | — | WL Type 3[6] |
| IU Flare | — | 0.84%[6] |
| Lens Flare | — | 8.50%[6] |
| Uniformity | — | 6.00%[6] |
| Total Focus Deviation | — | 0.202 µm[6] |
| Astigmatism | — | 0.119 µm[6] |
| Coma | — | 0.040 µm[6] |
| ISO DOF | — | 0.275 µm[6] |
| Wafer size | — | 200 mm (8 inch)[3] |
| Wavelength | — | 248 nm[4] |
| Process type | — | Scanner[4] |
| CIM interface | — | SECS[3] |
| Iso DOF | — | 0.241 µm[7] |
| Light source | — | Cymer ELS 5410[5] |
| Manufacturer | — | Nikon[3] |
| Model | — | NSR S 203 B[3] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →