KLA
ICOS CI 8 X 50 Lead
What it is
General reference — not yet source-verifiedLithography tools transfer patterned information into a photosensitive layer on a substrate. Lithography tools are used to define features that later steps such as etch, deposition, plating, or implantation follow.
How it works
General reference — not yet source-verifiedLithography systems generally position a substrate, establish alignment to a patterning reference, and expose photoresist so a later development step can reveal the intended pattern. Scanner-type lithography equipment generally forms patterns by controlled relative motion between the imaging path and the workpiece during exposure.
Where it fits in the process flow
General reference — not yet source-verifiedIn semiconductor and related microfabrication flows, lithography follows resist coating and precedes development. The patterned resist produced by lithography then serves as a temporary mask for downstream material modification steps.
Applications
General reference — not yet source-verifiedLithography equipment is used wherever repeated surface patterns must be formed with positional control. Typical applications include semiconductor device fabrication, packaging-related patterning, and other microfabrication processes that rely on patterned resist images.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Computer removed; no PC inside
- Doors in the front do not stay up as they should
- Hydraulic arm needs propping up or fixing
- Keeps homing itself
What do the numbers mean?
Power & electrical4
- 50/60 Hz[1]
Vacuum & pumping1
Control & software2
- Computer removed, No PC inside[1]
Configuration & options11
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Nikon NSR S 203 B— Same function class: Lithography, UnknownCompare in depthsource[1]
- EV Group 620 Mask— Same function class: Lithography, UnknownCompare in depthsource[1]
- SUSS MicroTec MA 8 BA 8 Gen 5 S Compact Mask— Same function class: Lithography, UnknownCompare in depthsource[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the ICOS CI 8 X 50 Lead are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ICOS CI 8 X 50 Lead are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the ICOS CI 8 X 50 Lead are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the ICOS CI 8 X 50 Lead are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the ICOS CI 8 X 50 Lead is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the ICOS CI 8 X 50 Lead are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 17, 2026.
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The SUSS MicroTec MA 8 BA 8 Gen 5 S Compact Mask is a lithography tool described as a compact mask aligner for imprint processing.
The Nikon NSR S 203 B is a lithography system used for photolithography on 200 mm wafers.
The EVG 620 Mask Aligner is a mask alignment tool for semiconductor manufacturing, supporting wafer sizes from 2 to 12 inches.