Comparison ledger
Lam Research Kiyo 45, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Kiyo 45Lam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Kiyo | Tegal 110 |
| Cited variants |
|
|
| Specifications | ||
| Configuration | 2 Chamber + 1 Strip[3] | — |
| Loadport | Brooks 799-701175-005[3] | — |
| ATM Robot | Brooks P/N 138150[3] | — |
| TM Robot | Brooks P/N 201600-01[3] | — |
| MKS E28B-30200 Process Vacuum Gauge | 0.1 Torr[3] | — |
| MKS 625A-14059 Chamber Vacuum Gauge | 1 Torr[3] | — |
| MKS D24B12TCECB0 Micro Wave Vacuum Gauge | 100 Tor[3] | — |
| Chamber configuration | 2 Chamber + 1 Strip[3] | — |
| Process Vacuum Gauge | MKS E28B-30200, 0.1 Torr[3] | — |
| Chamber Vacuum Gauge | MKS 625A-14059, 1 Torr[3] | — |
| Micro Wave Vacuum Gauge | MKS D24B12TCECB0, 100 Torr[3] | — |
| Air Lock Heating Gauge | Teledyne HPM-2002-OBE-LM[3] | — |
| Turbo Pump | Edwards SCU 1500[3] | — |
| Turbo Pump Controller | Edwards SCU 1600[3] | — |
| Bias RF Generator | Lam 3156110-214[3] | — |
| TCP RF Generator | Lam 3156110-313[3] | — |
| Manufacturer | Lam Research[4] | — |
| Model | Kiyo 45[3] | — |
| Category | Etch[4] | — |
| System type | Reactive ion etch (RIE) system[4] | plasma etch system[6] |
| Wafer format | 300 mm[5] | — |
| Plasma technology | Transformer Coupled Plasma[5] | — |
| model | — | 110 SE[2] |
| application focus | — | process development applications[2] |
| process capability | — | deep silicon plasma etching[2] |
| capabilities | — | very high aspect ratio trench etch and profile control[2] |
| configuration | — | multiple configurations with minimum technical intervention[2] |
| Supported components | — | MEMS and 3D-IC components[2] |
| Control capability | — | very high aspect ratio trench etch and profile control[6] |
| Physical description | — | compact[2] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →