Comparison ledger
Lam Research Rainbow 4520 i Oxide, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4520 i OxideLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4520 i Oxide | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Damage/Missing parts list | Pumps, chillers, and support items may not be included[1] | — |
| Phase | 3 Phase[2] | — |
| Configuration | 208 Volt[2] | — |
| Make | Lam[1] | — |
| Model | Rainbow 4520 i[1] | — |
| Equipment type | Oxide Etcher[1] | — |
| Wafer size | 8 inch[1] | 4 inch, 6 inch, 8 inch (with clamp change)[4] |
| Vintage | 1996[1] | — |
| Electrical | 3 Phase - 208 Volt[2] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[4] |
| Cryo DRIE etch rate | — | up to 5 µm/min[4] |
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