Comparison ledger
Lam Research Rainbow 4520 and Oxford Instruments Plasmalab 80 Plus RIE, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | Rainbow 4520Lam Research | Plasmalab 80 Plus RIEOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | 8" | 8" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4520 | Oxford Instruments Plasmalab 80 |
| Cited variants |
| — |
| Specifications | ||
| OEM | Lam Research[1] | — |
| Model | Lam Rainbow 4520[1] | — |
| Condition | Refurbished and Upgraded[1] | — |
| Chuck type | Clamp; customized[1] | — |
| Wafer size | Up to 8 inch capability; customized[1] | Small piece of wafer until max full 8 inches wafer[3] |
| Controller | Allwin21 PC with touch screen monitor[1] | — |
| Operation modes | Maintenance, Manual, Semi Automatic and Full Automatic[1] | — |
| Wafer handling | Fully automated, in-line, single-wafer plasma/RIE etching system[1] | — |
| Gases | 1-6 or 1-8 lines with MFC; maximum 9 lines[1] | — |
| Endpoint | Dual endpoint 405nm/520nm; EOP optional[1] | — |
| Configuration | — | 50/60 Hz[2] |
| Voltage | — | 415 VAC, 3 Phase[2] |
| Full Load Amps | — | 25.6 A[2] |
| Max Flow Rate Per Gas | — | 100 sccm[2] |
| RF Generator | — | 300 Watt 13.56 MHZ[2] |
| Table | — | Cool Down Only (No Heating)[2] |
| Typical Process Pressure | — | 30 - 100 Mtorr[2] |
| Pumping System | — | Corrosion Resistant Turbo Molecular Pump with Rotary Pump[2] |
| Available Gases in Chamber | — | Ar, CF4, O2, CHF3, SF6, & He[2] |
| Phase | — | 3 Phase[3] |
| Available gas in the chamber | — | Ar, CF4, O2, CHF3, SF6 & He.[3] |
| RF generator | — | 300 Watt 13.56MHz[3] |
| Typical process pressure | — | 30 – 100 mtorr[3] |
| Pumping system | — | Corrosion-resistant turbo-molecular pump with rotary pump[3] |
| Uniformity | — | 5 - 10 % range[4] |
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