Lam Research
Rainbow 4520
Plate 01Lam Research Rainbow 4420 4520 4620 4720 4428 4528 4628 Plasma Etch Semiconductor Equipment
Peter ChenWatch on YouTubePlate 02Lam Research Lam Rainbow 4400 4500 4600 4420 4520 4620 4720 plasma etcher semiconductor equipment
SemiStarWatch on YouTubePlate 03Upgrade Kit for Lam Rainbow 4400 4500 4600 4700 4420 4520 4620 4720 Plasma Etcher RIE
Allwin21Watch on YouTube
Wafer size
8"
Gas delivery
1-6 or 1-8 lines with MFC; maximum 9 lines[1]
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- Oxide etch
- Contact oxide etch
- Anisotropic via etch
- Oxide spacer etch
- Photoresist/oxide etchback planarization
- SOG/oxide etchback planarization
- Tapered contact etch
- In situ soft etch
- Anisotropic dielectric etch
- Silicon nitride etch
What do the numbers mean?
Wafer handling3
Gas & chemistry1
Control & software1
Configuration & options5
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Lam Rainbow 45XX Series | — | — | Series described as a fully automated, in-line, single-wafer plasma/RIE etching system with programmable switching between plasma and RIE modes. | allwin21.com[1] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Oxford Instruments Plasmalab 80 Plus RIE— Same function class: Etch, 8"Compare in depthsource[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Gases1-6 or 1-8 lines with MFC; maximum 9 lines[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Rainbow 4520 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Rainbow 4520 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Rainbow 4520 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Rainbow 4520 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Rainbow 4520 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Rainbow 4520 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]allwin21.com — allwin21.comallwin21.com
Last updated Jul 29, 2026.
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Oxford Instruments Plasmalab 80 Plus RIE is a reactive ion etcher with support for wafers up to 8 inches.
General referenceLam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.
The Tegal 1511e is a tri-electrode dual-frequency plasma etch system for processing three- to six-inch wafers.