Comparison ledger
Lam Research Rainbow 4528 I, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4528 ILam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Software | Envision 1.5.2[2] | — |
| RF | Paramount 1213 / Paramount MF 3KW[2] | — |
| Configuration | RF Cart[2] | — |
| AC Box | 002 (breakers)[2] | — |
| Robot | Harmonic Drive[2] | — |
| Loader | Hine Indexers 38A[2] | — |
| Controllers | AC2G controller ISO THV / AC2 main chamber THV[2] | — |
| GAS 1 | Ar: 500 sccm[2] | — |
| GAS 2 | CF4: 200 sccm[2] | — |
| GAS 3 | CHF3: 100 sccm[2] | — |
| GAS 4 | SF6: 100 sccm[2] | — |
| GAS 5 | N2: 100 sccm[2] | — |
| GAS 6 | O2: 100 sccm[2] | — |
| GAS 7 | He: 1000 sccm[2] | — |
| GAS 8 | NF3: 1000 sccm[2] | — |
| GAS 10 | O2: 100 sccm[2] | — |
| Type | Plasma etcher[2] | — |
| Wafer size | 8 inch[2] | — |
| RF cart | RF Cart[2] | — |
| AC Rack | on mezzanine[2] | — |
| Tool type | Plasma Etcher[2] | — |
| Controller | AC2G controller[2] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[3] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[3] |
| Physical description | — | compact[1] |
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