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Comparison ledger

, Vistec INS 3000versusDSS 200

Leica , Vistec INS 3000, Ontrak DSS 200, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
DSS 200Ontrak
OEMLeicaOntrak
Category——
Wafer size200mm8"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLeica , Vistec INS 3000Ontrak DSS 200
Cited variants—
  • OnTrak DSS 200 Series 1[1]
  • OnTrak DSS 200 Series 2[2]
Specifications
Wafer sizeSingle 150/200 mm wafer loadport[3]8" Silicon Wafer Processing[5]
TypeOptical defect review station[3]—
Wafer loadportSingle 150/200 mm wafer loadport[3]—
LightingBright field light source; DIC DUV light source[3]—
CameraUV and DUV camera[3]—
Optics6 optics: 150x, 100x, 50x, 25x, 10x, 5x[3]—
SoftwareViscon Software[3]—
Data interfaceKLARF input[3]—
Configuration—Series I[4]
Phase—Wafer Spin Washer/Dryer - 120 VAC - Single Phase - 60 Hz - 15 A[5]
Frequency—60 Hz[4]
Voltage—120 Vac[4]
Vintage—1996[4]
Make—Ontrak[4]
Model—DSS 200[4]
Power Phase—1 Phase[4]
AC Voltage—120 Vac[4]
Wafer sizes—8 inch[6]
Power—1 phase, 60 Hz, 120 Vac[4]
Tool type—wafer scrubber[7]
Sources (7)Every fact above is drawn from these public sources
  1. [1]axustech.comaxustech.com
  2. [2]axustech.comaxustech.com
  3. [3]dealer listingwotol.com
  4. [4]inventory listing
  5. [5]inventory listing
  6. [6]Equipment inventory listing
  7. [7]waferpedia.comwaferpedia.com